More evolved PGSD (Proximity Gap Suction Developer) for controlling movement of dissolution productsSAKURAI, Hideaki; OPPATA, Yukio; KAMEI, Shigenori et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, pp 63494J.1-63494J.8, issn 0277-786X, isbn 0-8194-6444-9, 2VolConference Paper

Capture-zone distribution in one-dimensional sub-monolayer film growth: a fragmentation theory approachGRINFELD, M; LAMB, W; O'NEILL, K. P et al.Journal of physics. A, Mathematical and theoretical (Print). 2012, Vol 45, Num 1, issn 1751-8113, 015002.1-015002.10Article

Critical noncolorings of the 600-cell proving the Bell-Kochen-Specker theoremWAEGELL, Mordecai; ARAVIND, P. K.Journal of physics. A, Mathematical and theoretical (Print). 2010, Vol 43, Num 10, issn 1751-8113, 105304.1-105304.13Article

Application of PGSD (proximity gap suction development) to 70 nm NAND mask fabricationSAKURAI, Hideaki; SHIBATA, Tooru; ITOH, Masamitsu et al.SPIE proceedings series. 2005, pp 29-36, isbn 0-8194-5830-9, 8 p.Conference Paper

New approach to determine best beam focusZUNIGA, Christian; TAWFIK, Tamer M.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7274, issn 0277-786X, isbn 978-0-8194-7527-5 0-8194-7527-0, 72742S.1-72742S.10, 2Conference Paper

Determining DOF Requirements Needed to Meet Technology Process AssumptionsGABOR, Allen; BRENDLER, Andrew; LI, Wai-Kin et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69241L.1-69241L.9, issn 0277-786X, isbn 978-0-8194-7109-3Conference Paper

CD Uniformity improvement for Double-Patterning Lithography (Litho-Litho-Etch) Using Freezing ProcessSUGIMACHI, Hisanori; KOSUGI, Hitoshi; YAMAGUCHI, Yoshikazu et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7273, issn 0277-786X, isbn 978-0-8194-7526-8 0-8194-7526-2, 72731D.1-72731D.7, 2Conference Paper

Impact of Patterning Strategy on Mask Fabrication Beyond 32nmMIMOTOGI, Shoji; HIGAKI, Tomotaka; TAKAHATA, Kazuhiro et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 702814.1-702814.9, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

Surprises in the suddenly-expanded infinite wellASLANGUL, Claude.Journal of physics. A, Mathematical and theoretical (Print). 2008, Vol 41, Num 7, issn 1751-8113, 075301.1-075304.25Article

Utilize AIMS simulation to estimate profile side-wall angleLU, Colbert; LIN, C. H; WANG, C. F et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, pp 634943.1-643943.10, issn 0277-786X, isbn 0-8194-6444-9, 2VolConference Paper

Continuous Image Writer with improved critical dimension performance for high-accuracy maskless optical patterningPAUFLER, J; BRUNN, St; KÖRNER, T et al.Microelectronic engineering. 2001, Vol 57-58, pp 31-40, issn 0167-9317Conference Paper

Damping caused by the gas flow in the holes of perforated structuresHENG YANG; MINHANG BAO; PAKULA, Lukasz et al.SPIE proceedings series. 2001, pp 307-313, isbn 0-8194-4323-9Conference Paper

The Nebulous Hotspot and Algorithm VariabilityWONG, Alfred K. K; LAM, Edmund Y.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7275, issn 0277-786X, isbn 978-0-8194-7528-2 0-8194-7528-9, 1Vol, 727509.1-727509.9Conference Paper

Gauss―Bonnet term on vacuum decayCAI, Rong-Gen; BIN HU; KOH, Seoktae et al.Physics letters. Section B. 2009, Vol 671, Num 1, pp 181-186, issn 0370-2693, 6 p.Article

Forward solve algorithms for optical critical dimension metrologyJIANG, P. L; CHU, H; HENCH, J et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69221O.1-69221O.7, issn 0277-786X, isbn 978-0-8194-7107-9Conference Paper

Photolithographic evaluation of various photoresist materials for maskmaking applicationsSINGH, Birender; MONTGOMERY, Warren.SPIE proceedings series. 2001, pp 511-520, isbn 0-8194-4031-0, 2VolConference Paper

Metrology, inspection, and process control for microlithography XVIII (Santa Clara CA, 23-26 February 2004)Silver, Richard M.SPIE proceedings series. 2004, isbn 0-8194-5288-2, 2Vol, XL, 1398 p, isbn 0-8194-5288-2Conference Proceedings

Methodologies for Evaluating CD-matching of CD-SEMKAWADA, Hiroki; KE, Ching-Ming; CHENG, Ya-Chun et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7272, issn 0277-786X, isbn 978-0-8194-7525-1 0-8194-7525-4, 72720Y.1-72720Y.9, 2Conference Paper

Exposure Tool for 32 nm Lithograpy: Requirements and Development ProgressHAZELTON, Andrew J; ISHIKAWA, Jun; MAGOME, Nobutaka et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7140, issn 0277-786X, isbn 978-0-8194-7381-3 0-8194-7381-2, 714028.1-714028.7, 2Conference Paper

Multigraph models for causal quantum gravity and scale dependent spectral dimensionGIASEMIDIS, Georgios; WHEATER, John F; ZOHREN, Stefan et al.Journal of physics. A, Mathematical and theoretical (Print). 2012, Vol 45, Num 35, issn 1751-8113, 355001.1-355001.26Article

Influence of Image Processing on Line-Edge Roughness in CD-SEM MeasurementYAMAGUCHI, Atsuko; YAMAMOTO, Jiro.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 692221.1-692221.8, issn 0277-786X, isbn 978-0-8194-7107-9Conference Paper

Integrating Cr and MoSi etch for optimal photomask critical dimension uniformity and phase uniformityWISTROM, Richard; KOMIZO, Toru; NEMOTO, Satoru et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7122, issn 0277-786X, isbn 978-0-8194-7355-4 0-8194-7355-3, 71220F.1-71220F.9, 2Conference Paper

Process manufacturability evaluation for next generation immersion technology nodeENOMOTO, M; SHIMOAOKI, T; MALLMANN, J et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69231W.1-69231W.12, issn 0277-786X, isbn 978-0-8194-7108-6Conference Paper

Error factor in bottom CD measurement for contact hole using CD-SEMABE, Hideaki; YAMAZAKI, Yuichiro.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6195-4, 2Vol, vol 2, 61524H.1-61524H.9Conference Paper

Software to simulate dry etch in photomask fabricationBABIN, S; BAY, K; OKULOVSKV, S et al.SPIE proceedings series. 2004, pp 183-189, isbn 0-8194-5513-X, 2Vol, 7 p.Conference Paper